Suzhou, China

Jianya Zhang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Chinese Academy of Sciences. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Jianya Zhang in Semiconductor Technology

Introduction

Jianya Zhang is a prominent inventor based in Suzhou, China. He has made significant contributions to the field of semiconductor technology, particularly with his innovative approaches to flexible materials. His work is recognized for its potential applications in advanced electronic devices.

Latest Patents

Jianya Zhang holds a patent for a "Super-flexible transparent semiconductor film and preparation method thereof." This invention outlines a method that includes providing an epitaxial substrate, growing a sacrificial layer, and stacking at least one layer of AlGaN epitaxial layer. The process also involves growing a nanopillar array containing GaN materials and etching the sacrificial layer to peel off the epitaxial structure. This innovative approach improves crystal quality, flexibility, and transparency, making it beneficial for invisible semiconductor devices and super-flexible applications. He has 1 patent to his name.

Career Highlights

Jianya Zhang is affiliated with the Chinese Academy of Sciences, where he conducts research and development in semiconductor technologies. His work has garnered attention for its practical applications and cost-effective methods in the production of flexible semiconductor devices.

Collaborations

Jianya Zhang has collaborated with notable colleagues such as Zhiwei Xing and Yukun Zhao. Their combined expertise contributes to the advancement of semiconductor research and innovation.

Conclusion

Jianya Zhang's contributions to semiconductor technology exemplify the importance of innovation in creating advanced materials for future electronic devices. His work not only enhances the performance of these materials but also paves the way for new applications in the industry.

Profile summary based on public USPTO records.
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