Golden, CO, United States of America

Jianping Xi

This inventor holds 3 USPTO granted patents. Top assignees: Mv Systems, Inc., Glasstech Solar, Inc.. Active years: 1989-2002.


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 109(Granted Patents)


Company Filing History:


Years Active: 1989-2002

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3 patents (USPTO):Explore Patents

Title: Innovations of Jianping Xi

Introduction

Jianping Xi is an accomplished inventor based in Golden, CO (US). He holds a total of 3 patents that showcase his contributions to the field of chemical vapor deposition technology. His work has significantly advanced the fabrication of high-quality thin film silicon and related materials.

Latest Patents

One of Jianping Xi's notable patents is the "Hot wire chemical vapor deposition method and apparatus using graphite hot rods." This invention describes a method for fabricating high-quality amorphous, micro-crystalline, and poly-crystalline thin film silicon. The process involves a silane gas that impinges upon a hot graphite rod assembly, breaking down into its individual constituents. These constituents then deposit on an inert substrate member. The distance between the hot graphite rod assembly and the substrate member is adjustable, and a shutter is provided to shield the substrate member during the heating process. The assembly contains multiple mutually parallel and coplanar rods, which are oscillated in a direction generally normal to the rods' extension.

Career Highlights

Jianping Xi has worked with several companies throughout his career, including Mv Systems, Inc. and Glasstech Solar, Inc. His experience in these organizations has allowed him to refine his expertise in chemical vapor deposition and related technologies.

Collaborations

Some of Jianping Xi's notable coworkers include Arun Madan and Scott Morrison. Their collaboration has contributed to the innovative advancements in the field.

Conclusion

Jianping Xi's work in the realm of chemical vapor deposition has made a significant impact on the development of thin film silicon technologies. His patents reflect his dedication to innovation and excellence in engineering.

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