Palo Alto, CA, United States of America

Jianou Shi

This inventor holds 1 USPTO granted patent. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jianou Shi. Retrieved from https://idiyas.com/inventor/jianou-shi-g72gusoc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 13.0

ph-index = 1


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Jianou Shi

Introduction

Jianou Shi is an accomplished inventor based in Palo Alto, California. He has made significant contributions to the field of optics, particularly in the development of advanced lens systems. His innovative work has led to the creation of a unique patent that enhances metrology systems.

Latest Patents

Jianou Shi holds a patent for a "Reflective compact lens for magneto-optic Kerr effect metrology system." This invention utilizes a Cassegrain or quasi-Cassegrain structure objective lens in a polar MOKE metrology system. The design features a primary concave mirror with a wider diameter than the secondary mirror, which defines an aperture for the transmission of a laser beam. The secondary mirror can be convex, concave, or flat, allowing for versatility in application.

Career Highlights

Throughout his career, Jianou Shi has focused on advancing optical technologies. His work has been recognized for its innovative approach to improving measurement systems. The patent he holds is a testament to his expertise and dedication to the field.

Collaborations

Jianou Shi has collaborated with notable colleagues, including Alex Zheng and Jun Wang. Their combined efforts have contributed to the success of various projects in optical engineering.

Conclusion

Jianou Shi's contributions to the field of optics through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the development of metrology systems, showcasing the importance of innovation in scientific research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…