Company Filing History:
Years Active: 2001-2002
Title: Innovations of Jianhua Hu in Titanium Nitride Technology
Introduction
Jianhua Hu is a notable inventor based in Sunnyvale, California, recognized for his contributions to the field of materials science, particularly in titanium nitride technology. With a total of two patents to his name, Hu has made significant advancements that enhance the reliability and performance of titanium-based films used in various applications.
Latest Patents
Hu's latest patents include a method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film. This innovative technique allows for the production of TiN films with a thickness greater than 1000 angstroms and a resistivity of less than 175 μΩcm. The process involves a series of CVD deposition and treatment steps, ensuring that the resulting films are not only highly conductive but also free of micro cracks. Another significant patent is a method of performing titanium/titanium nitride integration, which improves the reliability of integrated Ti/TiN CVD films. This method involves treating titanium films to make them unreactive to chlorine and hydrogen chloride, followed by the deposition of a thin seed layer of TiN.
Career Highlights
Jianhua Hu is currently employed at Applied Materials, Inc., a leading company in the semiconductor and materials engineering industry. His work focuses on developing advanced materials that are crucial for the manufacturing of electronic devices. Hu's expertise in CVD techniques has positioned him as a key contributor to the company's innovative projects.
Collaborations
Throughout his career, Hu has collaborated with talented coworkers such as Yin Lin and Fufa Chen. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Jianhua Hu's contributions to titanium nitride technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the field. His innovative methods not only advance material science but also pave the way for future developments in semiconductor technology.
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