Beijing, China

Jianheng Luo

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Beijing Naura Microelectronics Equipment Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jianheng Luo. Retrieved from https://idiyas.com/inventor/jianheng-luo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Jianheng Luo

Introduction

Jianheng Luo is a prominent inventor based in Beijing, China. He has made significant contributions to the field of microelectronics through his innovative patent. His work focuses on advanced methods for preparing oxide films, which are crucial in various electronic applications.

Latest Patents

Jianheng Luo holds a patent for an "Oxide film preparation method." This method involves placing a wafer in a reaction chamber and introducing a first mixed gas of a bombardment gas and an oxidization gas. By applying DC power and radio frequency (RF) power to the target, he excites the first mixed gas to form a plasma that bombards the target, resulting in the formation of an oxide film on the wafer. The process continues with the introduction of a second mixed gas, which includes nitrogen, to create an oxynitride film through similar excitation and bombardment techniques.

Career Highlights

Jianheng Luo is currently associated with Beijing Naura Microelectronics Equipment Co., Ltd. His role in the company allows him to apply his expertise in microelectronics and contribute to the development of cutting-edge technologies. His innovative approach has positioned him as a key figure in the industry.

Collaborations

Due to space constraints, details about collaborations will not be included.

Conclusion

Jianheng Luo's contributions to the field of microelectronics through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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