Jiangwei Duan

Title: Jiangwei Duan: Innovator in Defect Detection Technology

Introduction

Jiangwei Duan is a prominent inventor based in Foshan, China. He has made significant contributions to the field of defect detection technology, particularly in the semiconductor industry. His innovative approach has led to the development of a unique method that enhances the accuracy of defect identification in wafers.

Latest Patents

Jiangwei Duan holds a patent for a "Defect detection method, apparatus and device, and computer-readable storage medium." This patent outlines a comprehensive defect detection method that includes acquiring a photoluminescence detection result of a wafer to be detected. The process involves generating a defect heat map corresponding to the wafer based on the photoluminescence detection result and a preset heat map model. This model is constructed using a sample of photoluminescence detection results after electroluminescent defect marking. Ultimately, the method determines a defect detection result of the wafer according to the generated defect heat map. He has 1 patent to his name.

Career Highlights

Jiangwei Duan is currently associated with Ji Hua Laboratory, where he continues to push the boundaries of innovation in defect detection technologies. His work is instrumental in improving the reliability and efficiency of semiconductor manufacturing processes.

Collaborations

Jiangwei collaborates with notable colleagues, including Zhaoming He and Hai Bi, who contribute to the research and development efforts at Ji Hua Laboratory.

Conclusion

Jiangwei Duan's contributions to defect detection technology exemplify the impact of innovative thinking in the semiconductor industry. His patented methods are paving the way for advancements that enhance manufacturing precision and quality.