Ottawa, Canada

Jian Li

This inventor holds 1 USPTO granted patent. Top assignee: Fei Comapny. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jian Li. Retrieved from https://idiyas.com/inventor/jian-li-2uciagjb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations of Jian Li in Material Removal Technology

Introduction

Jian Li is an accomplished inventor based in Ottawa, Canada. He has made significant contributions to the field of material removal technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and uniformity of material removal processes, which is crucial in various applications.

Latest Patents

Jian Li holds a patent titled "Apparatus and method for reducing differential sputter rates." This invention involves a charged particle beam that uniformly removes material, especially crystalline material, from a target area. The method compensates for or alters the crystal orientation or structure of the material being removed. This technology is particularly suited for focused ion beam (FIB) micromachining of copper-based crystalline structures. The uniformity of material removal can be improved by passing incoming ions through a sacrificial layer formed on the surface of the material. This sacrificial layer is removed along with the material being milled. Additionally, the uniformity of removal can be enhanced by changing the morphology of the material, such as disrupting its crystal structure or altering its topography.

Career Highlights

Jian Li has made notable advancements in the field of micromachining and material science. His innovative approaches have led to improved techniques that are widely applicable in various industries. His patent reflects his commitment to enhancing the precision and effectiveness of material removal processes.

Collaborations

Jian Li has collaborated with esteemed colleagues, including Michael William Phaneuf and Richard F. Shuman. These collaborations have contributed to the development and refinement of his innovative technologies.

Conclusion

Jian Li's contributions to material removal technology through his patent demonstrate his expertise and innovative spirit. His work continues to influence advancements in the field, showcasing the importance of innovation in engineering and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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