Taipei, Taiwan

Jian-An Ke


Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 2014-2018

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7 patents (USPTO):Explore Patents

Title: The Innovations of Jian-An Ke

Introduction

Jian-An Ke is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor device fabrication, holding a total of 7 patents. His work focuses on enhancing the efficiency and performance of semiconductor devices, which are crucial in modern electronics.

Latest Patents

One of Jian-An Ke's latest patents is a method for semiconductor device fabrication. This method involves receiving a substrate with a gate structure and forming a spacer layer over the substrate and the gate structure. The process includes implanting carbon into the spacer layer at an angle tilted away from a first direction perpendicular to the top surface of the substrate, which increases the etch resistance of the spacer layer on the sidewalls of the gate structure. Additionally, the method may involve implanting germanium into the spacer layer at the first direction, which decreases the etch resistance of the spacer layer overlaying the gate structure and the substrate. The etching of the spacer layer exposes the gate structure, resulting in a first portion of the spacer layer on the sidewalls of the gate structure, maintaining its profile and thickness in subsequent fabrication processes.

Another notable patent is related to the epitaxial growth of doped film for source and drain regions. This patent describes mechanisms for epitaxially growing one or more doped silicon-containing materials to form source and drain regions of finFET devices. The dopants in these materials can be driven into the neighboring lightly-doped-drain (LDD) regions by thermal anneal. The cyclical deposition/deposition/etch (CDDE) process is utilized, where a first and a second doped material are formed, and a following etch removes most of the second doped material. This innovative process enables the formation of a highly doped silicon-containing material.

Career Highlights

Jian-An Ke is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work has significantly impacted the development of advanced semiconductor technologies, making him a valuable asset to his company and the field.

Collaborations

Some of Jian-An Ke's notable coworkers include Chun Hsiung Tsai and Tsan-Yao Chen. Their collaborative efforts contribute to the innovative projects at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Jian-An Ke's contributions to semiconductor device fabrication through his

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