Qingdao, China

Jialin Wang

This inventor holds 1 USPTO granted patent. Top assignee: China University of Petroleum (East China). Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jialin Wang. Retrieved from https://idiyas.com/inventor/jialin-wang-pguj753p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Jialin Wang in Anti-Friction Technology

Introduction

Jialin Wang is an accomplished inventor based in Qingdao, China. He has made significant contributions to the field of friction and wear technology. His innovative approach focuses on enhancing the performance and longevity of substrates through advanced methods.

Latest Patents

Jialin Wang holds a patent titled "Method for improving anti-friction and anti-wear properties of substrate." This invention discloses a method that involves cladding alloy powder on the surface of a substrate to form a cladding layer. Following this, a sequence of texturing and sulfurization treatments is applied to create a textured and ion-sulfurized cladding layer. This innovative process significantly improves the anti-friction and anti-wear properties of the substrate, thereby increasing its efficiency and service life. He has 1 patent to his name.

Career Highlights

Jialin Wang is affiliated with the China University of Petroleum, where he continues to advance research in materials science. His work has garnered attention for its practical applications in various industries.

Collaborations

Jialin Wang collaborates with notable colleagues, including Bin Han and Chunyang Hu, who contribute to his research endeavors.

Conclusion

Jialin Wang's innovative methods in improving anti-friction and anti-wear properties represent a significant advancement in material technology. His contributions are poised to enhance the efficiency and durability of various substrates in practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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