The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2025

Filed:

Oct. 31, 2022
Applicant:

China University of Petroleum (East China), Qingdao, CN;

Inventors:

Bin Han, Qingdao, CN;

Chunyang Hu, Qingdao, CN;

Xinhao Sun, Qingdao, CN;

Meiyan Li, Qingdao, CN;

Jialin Wang, Qingdao, CN;

Chenxin Jia, Qingdao, CN;

Xueda Li, Qingdao, CN;

Yong Wang, Qingdao, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/342 (2014.01); C23C 8/02 (2006.01); C23C 8/36 (2006.01); C23C 24/08 (2006.01);
U.S. Cl.
CPC ...
C23C 24/087 (2013.01); B23K 26/342 (2015.10); C23C 8/02 (2013.01); C23C 8/36 (2013.01);
Abstract

The present invention discloses a method for improving the anti-friction and anti-wear properties of substrate, and relates to the technical field of friction and wear. The method of present invention is to firstly clad alloy powder on the surface of substrate to form the cladding layer, and then perform the texturing and sulfurization treatment in sequence on the cladding layer to form a textured and ion-sulfurized cladding layer with anti-friction and anti-wear properties on the surface of substrate, so as to improve anti-friction and anti-wear properties of the substrate, and to increase efficiency as well as service life of the substrate.


Find Patent Forward Citations

Han, Bin. (2025). Method for improving anti-friction and anti-wear properties of substrate (U.S. Patent No. 12320006). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12320006

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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