Jialiang Wang

Title: Innovations by Inventor Jialiang Wang in Semiconductor Processing

Introduction

Jialiang Wang is a prominent inventor based in San Jose, California, known for his significant contributions to semiconductor processing technologies. With a remarkable portfolio of six patents, his work showcases innovative methods that enhance material properties and processing efficiency in the field.

Latest Patents

Jialiang Wang's latest patents include groundbreaking techniques for forming thermally stable carbon films and low-temperature graphene growth.

One notable method involves processing a substrate by introducing a deposition gas, which includes a hydrocarbon compound and a dopant compound, into a controlled process volume. This method maintains a pressure between about 0.5 mTorr to 10 mTorr while generating plasma at the substrate through a first radio frequency (RF) bias. The result is the deposition of a doped diamond-like carbon film, which can be further annealed to achieve desirable stress properties.

Another important patent focuses on low-temperature graphene growth, where carbon-containing and hydrogen-containing precursors are delivered to a semiconductor processing chamber. This innovative approach enables the formation of a layer of graphene on a substrate at temperatures below or around 600°C. The process effectively halts the flow of the carbon-containing precursor while maintaining the plasma, thereby enhancing control over the material properties.

Career Highlights

Throughout his career, Jialiang Wang has made meaningful strides in the semiconductor industry, having worked for established companies such as VMware, Inc. and Applied Materials, Inc. His expertise and innovative mindset have contributed to the development of cutting-edge technologies in these organizations.

Collaborations

Jialiang has collaborated with notable professionals in the field, including Komal Mangtani and Sesh Jalagam. Their collective efforts have fostered advancements in semiconductor processing technologies and enriched the research environment.

Conclusion

Jialiang Wang's innovative spirit and dedication to advancing semiconductor technologies are evident through his patents and collaborations. His work not only highlights his capabilities as an inventor but also contributes to the broader field of materials science and engineering, paving the way for future innovations in the industry.