Vmware, Inc.

Applied Materials, Inc.

Jialiang Wang

Sesh Jalagam

Komal Mangtani

Abhijit Basu Mallick

Nitin K Ingle

Susmit Singha Roy

Pramit Manna

Karthik Janakiraman

Eswaranand Venkatasubramanian

Rajaram Narayanan

Exemplary methods of semiconductor processing include delivering a carbon-containing precursor and a hydrogen-containing precursor to a processing region of a semiconductor processing chamber. A flowrate ratio of the hydrogen-containing precursor to the carbon-containing precursor may be maintained greater than or about 2:1. The methods include forming a layer of graphene on a substrate positioned within the processing region of the semiconductor processing chamber. The substrate may be maintained at a temperature below or about 600° C.

Low temperature graphene growth

A method of processing a substrate is provided including flowing a deposition gas comprising a hydrocarbon compound and a dopant compound into a process volume having a substrate disposed positioned on a substrate support. The process volume is maintained at a pressure of about 0.5 mTorr to about 10 mTorr. The method includes generating a plasma at the substrate by applying a first RF bias to the substrate support to deposit a doped diamond-like carbon film on the substrate. The doped diamond-like carbon film includes about 5 at. % to about 25 at. % of dopant and a first stress property. The method includes annealing the doped diamond-like carbon film at about 220° C. to about 450° C. to form an annealed film. The annealed film includes a second stress property. The second stress property having an absolute value less than or within 10% the first stress property.

Methods of forming thermally stable carbon film

Exemplary methods of semiconductor processing may include delivering a carbon-containing precursor and a hydrogen-containing precursor to a processing region of a semiconductor processing chamber. The methods may include generating a plasma of the carbon-containing precursor and the hydrogen-containing precursor within the processing region of the semiconductor processing chamber. The methods may include forming a layer of graphene on a substrate positioned within the processing region of the semiconductor processing chamber. The substrate may be maintained at a temperature below or about 600&#xb0; C. The methods may include halting flow of the carbon-containing precursor while maintaining the plasma with the hydrogen-containing precursor.

A user may create a blueprint that specifies an application's architecture, including virtual machines (VM) nodes, software services and application components within the VM nodes. To do so, the user manipulates a graphical user interface (GUI) rendered by a graph layout manager and a Scalable Vector Graphics (SVG) layout engine. The SVG layout engine parses declarative layout configurations and translates the declarative layout into SVG elements that visually represent the blueprint. Additional information may be rendered in independent layers overlaid on the GUI which a user may selectively activate or de-activate to show or hide, respectively, the additional information. The layers may be generated using extension points exposed via the declarative layout.

HTML5 graph overlays for application topology

A user may create a blueprint that specifies an application's architecture, including virtual machines (VM) nodes, software services and application components within the VM nodes. To do so, the user manipulates a graphical user interface (GUI) rendered by a Scalable Vector Graphics (SVG) layout engine. The SVG layout engine parses declarative layout configurations and translates the declarative layout into SVG elements that visually represent the blueprint. The SVG layout engine dynamically calculates absolute positions and sizes of child elements based on the declarative layout.

HTML5 graph layout for application topology

A user may create a blueprint that specifies an application's architecture, including virtual machines (VM) nodes, software services and application components within the VM nodes. To do so, the user manipulates a graphical user interface (GUI) rendered by a graph layout manager and a Scalable Vector Graphics (SVG) layout engine. The SVG layout engine parses declarative layout configurations and translates the declarative layout into SVG elements that visually represent the blueprint. The graph layout manager renders topology connections representing deployment dependencies in the GUI using a street-block-and-roads design pattern.

Connection paths for application topology

A graphical user interface (GUI) engine receives an input event associated with a drag-and-drop action, determines a Scalable Vector Graphics (SVG) element that relates to the input event, and causes an anchor element to be attached to the SVG element, such as be wrapping the SVG element with the anchor element. Attaching an anchor element to an SVG element and defining the anchor element as 'draggable' enables web browsers to perform drag-and-drop actions with SVG elements in a uniform and predictable manner. In one example use case, an SVG element may be wrapped with an anchor element when the SVG element is selected and dragged by a user, enabling an accurate representation of the SVG element to be displayed while the user is performing the drag-and-drop action.

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San Jose, CA, United States of America

Jialiang Wang