This inventor holds 2 USPTO granted patents. Top assignee: Mosel Vitelic Corporation. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Innovations of Jia-Rurng Hwu
Introduction
Jia-Rurng Hwu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of etching equipment through his innovative patents. With a total of 2 patents, Hwu continues to push the boundaries of technology in his industry.
Latest Patents
Hwu's latest patents include a piping system for etch equipment and a method to reduce particles in a load-lock chamber. The piping system patent discloses a design that includes an exhaust gas tube connected to an etching chamber for conveying exhaust gas out of the chamber. Additionally, it features a cooling gas tube that allows cooling gas to flow around the back side of the wafer placed in the chamber, effectively regulating the wafer's temperature. The cooling gas bypass tube is designed to manage gas flow in the cooling gas tube, while a series of heaters are strategically placed to prevent particle accumulation in the tube junctions.
The second patent focuses on a method for preventing corrosion and particulate in a load-lock chamber. This chamber is adjacent to an etching chamber and a wafer transfer module. The method involves coupling heating means to an N₂-purge tube to maintain the temperature within the load-lock chamber, ensuring that it does not drop below the environmental temperature.
Career Highlights
Jia-Rurng Hwu is currently employed at Mosel Vitelic Corporation, where he applies his expertise in developing advanced technologies. His work has been instrumental in enhancing the efficiency and reliability of etching processes.
Collaborations
Hwu collaborates with talented individuals such as Chi-Shu Huang and Kuang-Yung Wu, contributing to a dynamic and innovative work environment.
Conclusion
Jia-Rurng Hwu's contributions to the field of etching equipment through his patents demonstrate his commitment to innovation and technology. His work continues to influence advancements in the industry, showcasing the importance of inventive minds in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile