Jia-Jing Wang

Title: Innovations of Jia-Jing Wang

Introduction

Jia-Jing Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 2 patents, Wang continues to push the boundaries of technology.

Latest Patents

Wang's latest patents include a method of forming multiple layer attenuating phase shifting masks. This invention describes a new technique for creating a double layer attenuating phase shifting mask. A first pattern is formed in a layer of attenuating phase shifting material, while an alignment pattern is created in a layer of opaque material. A first resist is utilized to form the first pattern, and a pellicle is employed to restrict the deposition of a second resist to the alignment region of the mask only. As a result, neither the first resist nor the second resist must endure dry etching steps. The first resist is removed before the step of forming the first pattern in the attenuating phase shifting material, thereby improving the cleaning process before this step.

Career Highlights

Wang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor manufacturing processes.

Collaborations

Wang has collaborated with notable colleagues such as San-De Tzu and Wen-Hong Huang, contributing to various projects and innovations in the field.

Conclusion

Jia-Jing Wang's contributions to semiconductor technology through his innovative patents highlight his expertise and commitment to advancing the industry. His work continues to influence the development of new technologies in semiconductor manufacturing.