Ji-ye Kim

Title: The Innovative Contributions of Ji-ye Kim

Introduction

Ji-ye Kim is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of integrated circuit technology. With a total of 3 patents to his name, his work has had a considerable impact on the electronics industry.

Latest Patents

Ji-ye Kim's latest patents include a method of forming an integrated circuit device having a contact capping layer. This innovative device features a fin-type active region that protrudes from the substrate's top surface. It also includes a gate structure that intersects with the fin-type active region, along with a source/drain region and a contact capping layer. The design ensures that the contact capping layer has a protruding portion extending outward from the sidewall of the first contact structure. Another notable patent is the integrated circuit device having a fin-type active region, which shares similar structural elements and functionalities.

Career Highlights

Ji-ye Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at this leading company has allowed him to develop cutting-edge solutions in integrated circuit design.

Collaborations

Some of Ji-ye Kim's notable coworkers include Jung-hwan Chun and Min-chan Gwak. Their collaborative efforts contribute to the innovative environment at Samsung Electronics.

Conclusion

Ji-ye Kim's contributions to integrated circuit technology exemplify the spirit of innovation. His patents reflect a commitment to advancing electronic device capabilities. Through his work at Samsung Electronics, he continues to influence the future of technology.