Niskayuna, NY, United States of America

Ji-Ung Lee


Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 149(Granted Patents)


Company Filing History:


Years Active: 2004-2012

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7 patents (USPTO):

Title: Innovations of Ji-Ung Lee

Introduction

Ji-Ung Lee is a prominent inventor based in Niskayuna, NY (US), known for his significant contributions to technology and engineering. With a total of seven patents to his name, he has made notable advancements in the field of electron emitter arrays and inductors.

Latest Patents

One of Ji-Ung Lee's latest patents is titled "System and method for limiting arc effects in field emitter arrays." This innovative system improves the robustness of field-type electron emitter arrays by incorporating a resistive substance in the gate of the emitter array. This design allows arcing events to be isolated to a single emitter, ensuring that the remaining emitters can continue electron emission and limiting the short circuit current of the arc. Another significant patent is "High performance low volume inductor and method of making same." This invention features an inductor that includes an electrical conductor wound in a magnetic flux concentrating pattern, utilizing a plurality of carbon nanotubes that are aligned with the axis of the conductor.

Career Highlights

Ji-Ung Lee has built a successful career at General Electric Company, where he has been instrumental in developing cutting-edge technologies. His work has not only advanced the field of electronics but has also contributed to the overall innovation landscape.

Collaborations

Throughout his career, Ji-Ung Lee has collaborated with talented individuals such as Kelvin Ma and Anil Raj Duggal. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Ji-Ung Lee's contributions to the field of technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry and inspire future innovations.

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