Company Filing History:
Years Active: 2020-2022
Title: Innovations by Ji Sung Kang: Pioneering Dry Etching Technologies
Introduction
Ji Sung Kang, an accomplished inventor based in Gimje-si, South Korea, has made significant contributions to the field of dry etching technology. With a total of three patents to his name, Kang is recognized for his innovative approaches that enhance the efficiency and precision of etching processes across various materials.
Latest Patents
Kang's most recent patents focus on the design and functionality of dry etching apparatuses. The first patent, titled "Dry Etching Apparatus," introduces a device capable of applying various materials with intricate designs. This apparatus features an anode unit and a cathode unit connected to a bidirectional voltage source, which changes polarity over time. This design allows for versatility in material application.
The second patent, "Dry Etching Device and Method for Controlling Same," propounds a dry etching device that guarantees excellent accuracy and can be utilized for different materials. This invention includes components such as an anode part, a cathode part that receives bi-directional voltage power, a leveling part for maintaining a work-piece in a flat state, and a bi-directional voltage power supplier that efficiently powers the cathode part.
Career Highlights
Ji Sung Kang's career is marked by his dedication to advancing etching technology. He is currently employed at Vault Creation Co., Ltd., where he continues to innovate and develop advanced solutions for various applications. His work has earned him a reputable status among peers in the industry.
Collaborations
Throughout his professional journey, Kang has collaborated with talented colleagues, including Sang Jun Choi and Kyung Jin Lee. These partnerships have further enhanced his innovation capacity and allowed for the exchange of ideas and expertise in the field.
Conclusion
With his groundbreaking patents and a commitment to improving dry etching technologies, Ji Sung Kang stands out as a leading figure in his field. His contributions not only reflect his ingenuity as an inventor but also signify an important advancement in the capabilities of etching apparatuses. As he continues to innovate, the impact of his work will undoubtedly influence future developments in technology.