The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Apr. 18, 2017
Applicants:
Sang Jun Choi, Seoul, KR;
Ji Sung Kang, Jeollabuk-do, KR;
Inventors:
Assignee:
VAULT CREATION CO., LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); H05H 1/46 (2006.01); H01L 21/311 (2006.01); H01L 21/3065 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32136 (2013.01); H01J 37/32 (2013.01); H01J 37/32568 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/32139 (2013.01); H01L 21/6719 (2013.01); H01L 21/67069 (2013.01); H01L 21/67248 (2013.01); H01L 21/68742 (2013.01); H01L 21/68785 (2013.01); H05H 1/46 (2013.01); H01J 2237/002 (2013.01); H01J 2237/334 (2013.01); H01L 23/53228 (2013.01);
Abstract
The present invention relates to a control method of a dry etching apparatus which can be applied regardless of materials. The control method of a dry etching apparatus may include: a work piece positioning step of positioning a work piece close to a surface of a cathode unit, facing an anode unit; a bidirectional voltage source applying step of applying a voltage to the cathode unit, the voltage having a polarity alternating between a positive voltage and a negative voltage with time; and an etching step of etching the surface of the work piece using plasma generated by the bidirectional voltage source applied to the cathode unit.