Suwon-si, South Korea

Ji Soo Oh


Average Co-Inventor Count = 11.5

ph-index = 1


Company Filing History:


Years Active: 2021

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2 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Ji Soo Oh

Introduction

Ji Soo Oh, an innovative inventor based in Suwon-si, South Korea, has contributed significantly to the field of plasma technology through his groundbreaking inventions. With a total of two patents to his name, Ji Soo Oh continues to push the boundaries of what is possible in plasma generation and ion beam etching.

Latest Patents

Ji Soo Oh's latest inventions showcase his expertise and creativity. His first patent, titled "Plasma Source and Plasma Generation Apparatus Using the Same," describes an advanced plasma source device consisting of a pair of divided electrodes, including a first and a second divided electrode. These electrodes are electrically coupled and spaced apart, featuring a ferrite structure that is strategically placed between them. This innovative design enhances plasma generation efficiency.

His second patent, "Ion Beam Etching Apparatus," outlines a sophisticated apparatus that incorporates a plasma chamber for generating plasma from process gas. Key components include a plasma valve, an ion-beam source, and an etching chamber designed to accommodate objects for etching. The apparatus is equipped with exhausting pumps to manage radicals within both the plasma and etching chambers, showcasing Ji Soo Oh's commitment to enhancing manufacturing processes in various industries.

Career Highlights

Ji Soo Oh is a critical member of the Research and Business Foundation at Sungkyunkwan University, where he collaborates with leading professionals in the field. His contributions to research and technology development have made him a respected figure in his industry. Over the years, Ji has honed his skills in plasma technology, resulting in innovative solutions that meet the demands of modern technology.

Collaborations

Throughout his career, Ji Soo Oh has worked closely with colleagues, including Geun Young Yeom and Ki Hyun Kim. Their collaborative efforts have fostered an environment of innovation and problem-solving, allowing them to tackle complex challenges in their respective fields. This teamwork contributes to a productive research atmosphere, propelling forward advancements in plasma technology and etching processes.

Conclusion

Ji Soo Oh stands out as a distinguished inventor whose work in plasma technology and ion beam etching is paving the way for future advancements in various applications. His notable patents and collaborative spirit exemplify his dedication to innovation, making him a key player in the field. As technology continues to evolve, inventors like Ji Soo Oh will undoubtedly shape the future with their groundbreaking discoveries.

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