Daejeon, South Korea

Ji-II Park

This inventor holds 1 USPTO granted patent. Top assignees: Korea Advanced Institute of Science and Technology, Yeungnam University. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Ji-II Park: Innovator in LiDAR Technology

Introduction

Ji-II Park is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of LiDAR technology, particularly in enhancing the accuracy and efficiency of point cloud data processing. His innovative approach addresses challenges faced in adverse weather conditions, showcasing his expertise and dedication to advancing technology.

Latest Patents

Ji-II Park holds a patent for a "Method and apparatus for removing LiDAR point cloud noise." This invention discloses a method that effectively removes LiDAR point cloud noise acquired in snowfall and rain environments in real time. By doing so, it preserves the environmental characteristics of the LiDAR point cloud, maximizing its utilization. He has 1 patent to his name, reflecting his innovative contributions to the field.

Career Highlights

Throughout his career, Ji-II Park has worked with esteemed institutions such as the Korea Advanced Institute of Science and Technology and Yeungnam University. His roles in these organizations have allowed him to collaborate with other experts and contribute to significant advancements in technology.

Collaborations

Some of his notable coworkers include Kyung Soo Kim and Min Seong Choi. Their collaborative efforts have further enriched the research and development in the field of LiDAR technology.

Conclusion

Ji-II Park's innovative work in LiDAR technology exemplifies his commitment to improving data processing methods in challenging environments. His contributions are vital for the advancement of this technology, and his patent reflects his significant impact in the field.

Profile summary based on public USPTO records.
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