This inventor holds 4 USPTO granted patents and 3 published patent applications. Top assignees: Semes Co., Ltd., Semes Co., Ltd.. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Title: Innovations by Ji Hyeon Kim
Introduction
Ji Hyeon Kim is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate treatment technology. With a total of 4 patents to his name, his work focuses on enhancing the efficiency and effectiveness of substrate treating processes.
Latest Patents
Ji Hyeon Kim's latest patents include a substrate treating liquid supply unit and a substrate treating apparatus that incorporates this unit. The substrate treating liquid supply unit is designed to maintain a constant liquid level at the nozzle of an inkjet head unit through real-time water level measurement. This innovation includes a first reservoir connected to the inkjet head unit, a water level sensor, and a pressure control module that adjusts the pressure based on variations in the water level. The second patent describes a unit for supplying a substrate-treating liquid, which features a first and second reservoir that maintain a differential pressure to establish a consistent flow rate. This system is crucial for efficiently supplying and recovering substrate-treating liquid.
Career Highlights
Ji Hyeon Kim is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate treatment technology. His work has been instrumental in advancing the capabilities of inkjet head units and improving the overall substrate treatment process.
Collaborations
Some of Ji Hyeon Kim's coworkers include Dong Hwa Lee and Dai Geon Yoon. Their collaborative efforts contribute to the innovative environment at Semes Co., Ltd.
Conclusion
Ji Hyeon Kim's contributions to substrate treatment technology through his patents demonstrate his commitment to innovation and efficiency in the field. His work continues to influence advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
