The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Dec. 29, 2022
Semes Co., Ltd., Chungcheongnam-do, KR;
Dai Geon Yoon, Chungcheongnam-do, KR;
Soo Hong Lee, Gyeonggi-do, KR;
Dong Hwa Lee, Chungcheongnam-do, KR;
Ji Hyeon Kim, Chungcheongnam-do, KR;
Sang Hwa Lee, Chungcheongnam-do, KR;
Dae Sung Kim, Chungcheongnam-do, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
Provided are an apparatus for providing a substrate processing liquid having an optimal structure in the correlation between securing internal agitation fluidity and recovery of sloshing, and a substrate processing system including the same. The apparatus for providing substrate processing liquid comprises a storage tank for storing substrate processing liquid, and a partition wall installed inside the storage tank and for dividing an internal space of the storage tank, wherein the apparatus is connected to a substrate processing apparatus for discharging the substrate processing liquid onto a substrate to provide the substrate processing liquid to the substrate processing apparatus, wherein the partition wall includes a plurality of holes formed passing through one surface and the other surface.