This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Samsung Electronics Ltd., Semes Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
2 out of 6,229 
1 out of 237 Years Active: 2026
Title: Innovations of Ji Hoon Cha
Introduction
Ji Hoon Cha is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology and substrate processing. With a total of 2 patents, his work has advanced the efficiency and effectiveness of various processes in the industry.
Latest Patents
One of Ji Hoon Cha's latest patents is titled "Apparatus and method for processing substrate." This invention focuses on reducing the concentration of process by-products in a chemical solution. The apparatus includes a substrate rotating device, a chemical solution supply device, a chemical solution discharge line, a chemical solution circulation line, and a discharged chemical solution selection device. This innovative design allows for the effective management of chemical solutions during substrate processing.
Another significant patent is "Semiconductor device and method of fabricating the same." This invention describes a semiconductor device that comprises a substrate with NMOSFET and PMOSFET regions. It features first and second channel patterns, source/drain patterns, and a gate electrode. The design enhances the performance of semiconductor devices by optimizing the arrangement of the components.
Career Highlights
Ji Hoon Cha has worked with prominent companies in the technology sector, including Samsung Electronics Ltd. and Semes Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and substrate processing.
Collaborations
Ji Hoon Cha has collaborated with various professionals in his field, including his coworker Hyun-Kwan Yu. Their joint efforts have led to advancements in semiconductor technology and innovative solutions in substrate processing.
Conclusion
Ji Hoon Cha's contributions to the field of semiconductor technology and substrate processing are noteworthy. His patents reflect his commitment to innovation and excellence in engineering. Through his work, he continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile