The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Nov. 07, 2023
Applicants:

Semes Co., Ltd., Cheonan-si, KR;

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Min Jung Kim, Chungcheongnam-do, KR;

Jin Ah Han, Chungcheongnam-do, KR;

Hee Hwan Kim, Sejong-si, KR;

Yong Hoon Hong, Seoul, KR;

Kyoung Suk Kim, Suwon-si, KR;

Jong Hyeok Park, Suwon-si, KR;

Jin Hyung Park, Suwon-si, KR;

Dae Hyuk Chung, Suwon-si, KR;

Ji Hoon Cha, Suwon-si, KR;

Assignees:

SEMES CO., LTD., Cheonan-si, KR;

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); H10P 50/64 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0424 (2026.01); H10P 50/642 (2026.01);
Abstract

An apparatus and method for processing a substrate can reduce the concentration of process by-products in a chemical solution. The apparatus includes a substrate rotating device configured to rotate a seated substrate in a spinning manner, a chemical solution supply device configured to supply a chemical solution to the substrate, a chemical solution discharge line configured to discharge the chemical solution having undergone a process to an outside, a chemical solution circulation line configured to circulate the chemical solution having undergone the process to the chemical solution supply device, and a discharged chemical solution selection device configured to discharge a chemical solution containing a first amount of process by-products to the outside through the chemical solution discharge line and to circulate a chemical solution containing a second amount of process by-products through the chemical solution circulation line, wherein the first amount of process by-products is larger than the second amount of process by-products.


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