This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Innovations by Jhe-Hong Wang: Enhancing Semiconductor Cleaning Efficiency
Introduction
Jhe-Hong Wang, an accomplished inventor based in Hsinchu, Taiwan, is known for his significant contributions to the semiconductor industry. His innovative work has resulted in a patented invention focused on improving the efficiency of ball mount cleaning processes.
Latest Patents
Jhe-Hong Wang holds a patent for a system designed to enhance the efficiency of cleaning semiconductor package assemblies. This inventive system features a sprayer device equipped with multiple nozzles that direct pressurized cleaning fluid towards the assemblies. Additionally, a conveyor system allows for the movement of the semiconductor package assemblies in relation to the sprayer device. A dryer, positioned away from the sprayer, directs a pressurized gas flow to remove any excess cleaning fluid, ensuring a thorough cleaning process. The design includes strategically displaced nozzles that create separate spray distribution patterns, reducing overlap and optimizing cleaning efficiency.
Career Highlights
Wang is affiliated with Taiwan Semiconductor Manufacturing Company (TSMC), a leading entity in the semiconductor industry known for its advanced technology and innovation. His position at TSMC has allowed him to work on groundbreaking research and develop solutions that meet the industry's evolving demands.
Collaborations
Throughout his career, Jhe-Hong Wang has collaborated with esteemed colleagues, including Ying-Hao Wang and Chien-Lung Chen. These partnerships highlight a strong team synergy focused on advancing semiconductor technologies and improving manufacturing processes.
Conclusion
Jhe-Hong Wang’s patent demonstrates not only his inventive prowess but also his commitment to enhancing the semiconductor manufacturing process. His work at TSMC and collaborations with other talented engineers amplify the impact of his innovations, leading to more efficient cleaning systems in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile