Sanchong, Taiwan

Jerwei Hsieh


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Jerwei Hsieh: Advancements in Micro-Electro-Mechanical Systems

Introduction: Jerwei Hsieh, an accomplished inventor based in Sanchong, Taiwan, has made significant contributions to the field of Micro-Electro-Mechanical Systems (MEMS) through his innovative inventions. With a total of four patents to his name, Hsieh's work focuses on methods that enhance the fabrication and functionality of MEMS components.

Latest Patents: Among his latest inventions, Jerwei Hsieh has developed several notable patents. One of them is a Selective Etching Method, which offers a unique etching procedure characterized by a lateral protection function. The defined steps include providing a substrate, creating multiple tunnels, forming a lateral strengthening structure on the tunnel's peripheral wall, and a sequence of etching processes that culminate in the revealing of an unstrengthened structure. This method is poised to improve the precision and reliability of fabricated components.

Another remarkable patent is the Corner Compensation Method for Fabricating MEMS and Structure Thereof. This method involves a detailed series of steps starting from substrate preparation, forming a conductive layer, executing photolithography, and systematically etching to create deep trench structures. A peripheral compensation structure is integrated into the process, enhancing the performance of MEMS by compensating for variations in manufacturing.

Career Highlights: Jerwei Hsieh is a key contributor at Walsin Lihwa Corporation, a name that resonates in the field of electronics and materials engineering. His role there allows him to engage in groundbreaking research and development, pushing the boundaries of what is achievable in MEMS technology.

Collaborations: Throughout his career, Hsieh has collaborated with notable colleagues, including Weileun Fang and Huai-Yuan Chu. Together, they have worked towards advancing the technological landscape within their field, fostering teamwork and innovation.

Conclusion: Jerwei Hsieh exemplifies the spirit of innovation through his contributions to the MEMS industry. His patents not only reflect his ingenuity but also pave the way for future developments in technology. As he continues to push the limits of what is possible, Hsieh’s work will undoubtedly have a lasting impact on the industry and inspire future inventors.

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