The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2006

Filed:

May. 06, 2004
Applicants:

Jerwei Hsieh, Sanchong, TW;

Huai-yuan Chu, Shulin, TW;

Julius Ming-lin Tsai, Taipei, TW;

Weileun Fang, Hsinchu, TW;

Inventors:

Jerwei Hsieh, Sanchong, TW;

Huai-Yuan Chu, Shulin, TW;

Julius Ming-Lin Tsai, Taipei, TW;

Weileun Fang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02N 1/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A high-aspect-ratio-microstructure (HARM) is provided. The structure includes: a substrate; a lower structure with a comb shape fixedly mounted on said substrate and having first plural comb fingers, wherein each of the first plural comb fingers has a thin slot thereon; an upper structure with a comb shape having second plural comb fingers, wherein the lower structure and the upper structure have a height difference therebetween so as to form an uneven surface; and a lateral strengthening structure formed at vertically peripheral walls of the first plural comb fingers and the second plural comb fingers for protecting the plural first and second comb fingers.


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