Jerry Yang

Title: Jerry Yang: Innovator in Plasma Processing Technology

Introduction

Jerry Yang is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of plasma processing technology. His innovative methods have advanced the efficiency of etching processes in semiconductor manufacturing.

Latest Patents

Jerry Yang holds a patent titled "Methods for reducing etch rate loading while etching through a titanium." This patent describes a method in a plasma processing chamber for etching through selected layers of a wafer stack. The method involves etching at least partially through an anti-reflective layer with a specific chemistry that includes both an etchant chemical and a polymer-forming chemical. Additionally, it details the etching of the metallization layer with a different chemistry, enhancing the precision of the etching process.

Career Highlights

Jerry Yang is associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His work has been instrumental in developing advanced technologies that improve manufacturing processes. With a total of 1 patent, he has demonstrated his expertise and commitment to innovation in his field.

Collaborations

Throughout his career, Jerry has collaborated with talented individuals such as Susan C Abraham and Peter H Chen. These collaborations have contributed to the development of cutting-edge technologies in plasma processing.

Conclusion

Jerry Yang's contributions to plasma processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Lam Research Corporation highlight his role as a key inventor in advancing manufacturing techniques.