Glasgow, United Kingdom

Jerome Daviot


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 62(Granted Patents)


Location History:

  • Glasgow, GB (2004 - 2007)
  • Antony, FR (2008)

Company Filing History:


Years Active: 2004-2008

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4 patents (USPTO):Explore Patents

Title: Innovator Jerome Daviot: Advancing Semiconductor Cleaning Technologies

Introduction

Jerome Daviot, an inventive mind based in Glasgow, GB, is making significant contributions to the field of semiconductor technology. With a total of four patents under his belt, he specializes in developing compositions for cleaning processes that are essential for maintaining the efficiency and reliability of semiconductor devices.

Latest Patents

Daviot's recent work includes groundbreaking patents that focus on chemical compositions used in the cleaning of organic and plasma etched residues. His first notable patent involves a composition designed for stripping photoresist and cleaning residues from substrates. This innovative formulation consists of fluoride compounds, sulfoxide or sulfone solvents, and water. Additionally, the composition may incorporate corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids, and bases, ensuring optimal cleaning performance.

Another significant patent involves aqueous phosphoric acid compositions tailored for cleaning semiconductor devices. This invention features dilute aqueous solutions containing phosphoric acid, which are effective in removing plasma etch residues from semiconductor substrates. The solution may also contain an alkaline compound or other acid compounds, enhancing its efficacy in cleaning applications.

Career Highlights

Jerome Daviot is currently affiliated with EKC Technology Inc., where he continues to innovate within the semiconductor cleaning sector. His expertise in the formulation of cleaning agents is crucial for the advancement of semiconductor manufacturing, impacting various technologies that utilize these devices.

Collaborations

Daviot has collaborated with notable professionals in the field, including Douglas Holmes and Robert J Small. These collaborations have allowed for a synergistic approach to innovation, helping to propel forward the development of effective cleaning technologies for the semiconductor industry.

Conclusion

Through his patents and collaborative efforts, Jerome Daviot exemplifies the spirit of innovation in the semiconductor realm. His contributions not only improve cleaning processes but also enhance the overall performance and longevity of semiconductor devices. With continued research and development, Daviot's work promises to play a pivotal role in the future of semiconductor technology.

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