Company Filing History:
Years Active: 2007-2009
Certainly! Here is the article about inventor Jeroen Huijbregstse:
Title: Unveiling the Innovations of Jeroen Huijbregstse in the Field of Lithography
Introduction: Jeroen Huijbregstse, an accomplished inventor based in Breda, Netherlands, has made significant contributions to the field of lithography. With two patents under his belt, his work revolves around precise methods for determining model parameters and optimizing overlay conditions in device manufacturing.
Latest Patents:
1. *Lithographic Apparatus and Model Parameter Determination:*
Jeroen's method focuses on determining parameters of a model that indicate the position of an object. By measuring positional parameters of alignment marks and utilizing weighing coefficients, he effectively determines crucial model parameters.
2. *Position Determination and Overlay Optimization:*
In his patent, Jeroen introduces a method for optimizing the alignment condition of a lithographic projection apparatus. Through calculating variances of diffracted signals and adjusting the alignment condition accordingly, he enhances the precision of the lithographic process.
Career Highlights:
Jeroen Huijbregstse is a valuable asset at ASML Netherlands B.V., a leading company in the lithography industry. His innovative approach and attention to detail have played a pivotal role in advancing lithographic technologies within the company.
Collaborations:
Within the dynamic environment of ASML Netherlands B.V., Jeroen collaborates closely with esteemed colleagues such as Sicco Ian Schets and Maurits Van Der Schaar. Together, they form a formidable team driving innovation and excellence in the field of lithography.
Conclusion:
In conclusion, Jeroen Huijbregstse's inventive prowess in lithography shines through his patented methods for model parameter determination and overlay optimization. His collaborations within ASML Netherlands B.V. underscore his commitment to pushing the boundaries of technology in the realm of device manufacturing. Jeroen's contributions undoubtedly leave a lasting impact on the industry, paving the way for further advancements in lithography.