The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Dec. 17, 2003
Sicco Ian Schets, Eindhoven, NL;
Jeroen Huijbregstse, Breda, NL;
Allan Reuben Dunbar, London, GB;
Nicolaas Petrus Van Der Aa, Helmond, NL;
Sicco Ian Schets, Eindhoven, NL;
Jeroen Huijbregstse, Breda, NL;
Allan Reuben Dunbar, London, GB;
Nicolaas Petrus Van Der Aa, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.