Jeric Sarad

Title: Jeric Sarad: Innovator in Substrate Structures

Introduction

Jeric Sarad is a notable inventor based in Mechanicville, NY (US). He has made significant contributions to the field of integrated circuit technology. His innovative work focuses on enhancing the coupling of surface plasmons to incident light through advanced substrate structures.

Latest Patents

Jeric Sarad holds a patent for a "Substrate structure with spatial arrangement configured for coupling of surface plasmons to incident light." This patent describes a substrate structure for an integrated circuit (IC) that includes a first dielectric layer positioned above a semiconductor substrate. The design features a first plurality of trenches extending into the dielectric layer, with a first metal formed within these trenches. The spatial arrangement of the trenches is crucial as it facilitates the coupling of surface plasmons in the metal to at least one wavelength of incident light. He has 1 patent to his name.

Career Highlights

Jeric Sarad is currently employed at Globalfoundries Inc., where he applies his expertise in semiconductor technology. His work contributes to the advancement of integrated circuits and their applications in various electronic devices.

Collaborations

Jeric collaborates with esteemed colleagues such as Somnath Ghosh and Eswar Ramanathan. Their combined efforts in research and development foster innovation in the semiconductor industry.

Conclusion

Jeric Sarad's contributions to substrate structures and integrated circuit technology highlight his role as a key innovator in the field. His patent and collaborations reflect his commitment to advancing technology and enhancing electronic performance.