Jeremy Chang

Title: The Innovative Contributions of Jeremy Chang

Introduction

Jeremy Chang is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of plasma etching technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of plasma chambers used in various manufacturing processes.

Latest Patents

One of Jeremy's latest patents is the "Edge ring assembly with dielectric spacer ring." This invention involves an edge ring assembly that surrounds a substrate support surface in a plasma etching chamber. The assembly comprises an edge ring and a dielectric spacer ring, which insulates the edge ring from the baseplate. This design helps decrease the buildup of polymer at the underside and along the edge of a substrate, thereby increasing plasma etching uniformity.

Another significant patent is the "Method of cleaning aluminum plasma chamber parts." This method outlines a process for cleaning components with aluminum or anodized aluminum surfaces. The steps include soaking the surface in a diluted sulfuric peroxide solution, followed by rinsing with water, and repeating the process with a dilute nitric acid solution. This innovative cleaning method enhances the maintenance of plasma chamber components.

Career Highlights

Jeremy Chang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that enhance the performance of plasma etching systems. His contributions have been instrumental in driving innovation within the company.

Collaborations

Throughout his career, Jeremy has collaborated with talented individuals such as Andreas Fischer and Babak Kadkhodayan. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Jeremy Chang's innovative work in plasma etching technology has led to significant advancements in the field. His patents reflect a commitment to improving manufacturing processes and enhancing the performance of plasma chambers. His contributions continue to influence the industry positively.