Jeonghoon Jang

Title: Jeonghoon Jang: Innovator in Substrate Processing Technology

Introduction

Jeonghoon Jang is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of substrate processing, particularly through his innovative methods that enhance the efficiency of semiconductor manufacturing.

Latest Patents

Jeonghoon Jang holds a patent for a substrate processing method. This method focuses on increasing the wet etch rate of the SiCN layer to minimize overhangs formed on stepped structures. The process involves supplying a carbon-containing silicon source and nitrogen gas simultaneously while applying power. Following this, a post-treatment is performed, where the wet etch rate of the SiCN layer is modulated by the amount of nitrogen source supplied. This innovation is crucial for improving the quality and precision of semiconductor devices.

Career Highlights

Jeonghoon Jang is currently employed at ASML IP Holding B.V., a company renowned for its advanced technology in the semiconductor industry. His work has positioned him as a key player in the development of innovative substrate processing techniques.

Collaborations

Jeonghoon collaborates with talented individuals in his field, including KiKang Kim and Youngmin Kim. Their combined expertise contributes to the advancement of substrate processing technologies.

Conclusion

Jeonghoon Jang's contributions to substrate processing technology exemplify the importance of innovation in the semiconductor industry. His patent and collaborative efforts highlight his commitment to enhancing manufacturing processes.