Hwaseong, South Korea

Jeong Yeon Song

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeong Yeon Song. Retrieved from https://idiyas.com/inventor/jeong-yeon-song

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jeong Yeon Song and Semiconductor Manufacturing Innovation.

Introduction

Jeong Yeon Song is an inventor associated with Hwaseong, South Korea, and Samsung Electronics Co., Ltd. His listed patent concerns substrate treatment equipment and a method for manufacturing semiconductor devices.

Latest Patents

Song is credited with 1 patent: “Substrate Treatment Apparatus and Semiconductor Device Manufacturing Method Using the Same.” The invention describes loading a substrate into a treatment apparatus, depositing material on it, and cleaning the apparatus.

The apparatus includes a housing with a treatment area, a gas supply for delivering process gases, and a remote plasma supply that uses radio-frequency power to generate process plasmas. A shower head delivers the plasmas into the treatment area. The second process plasma is used to clean membrane material deposited on the housing’s inner wall. The described gas supply provides the first process gas at a flow rate of 1,000 to 15,000 sccm.

Career Highlights

The available information associates Song with Samsung Electronics Co., Ltd. and identifies his work in semiconductor device manufacturing processes, particularly deposition equipment and in-situ cleaning.

Collaborations

Woo Hyun Lee and Su Ji Gim are listed as Song’s coworkers. The provided information does not specify their roles in the patent or the nature of their collaboration.

Conclusion

Jeong Yeon Song’s listed patent addresses equipment and process steps for deposition and cleaning, contributing to the practical challenges of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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