Jeong Hwan Kim

Title: Jeong Hwan Kim: Innovator in Semiconductor Processing

Introduction

Jeong Hwan Kim is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent related to boron nitride.

Latest Patents

Jeong Hwan Kim holds a patent for "Boron nitride for mask patterning." This patent outlines exemplary deposition methods that involve delivering a boron-containing precursor and a nitrogen-containing precursor to a processing region of a semiconductor processing chamber. The methods also include providing a hydrogen-containing precursor alongside the boron and nitrogen precursors. Notably, the flow rate ratio of the hydrogen-containing precursor to either the boron-containing precursor or the nitrogen-containing precursor is greater than or about 2:1. Furthermore, the methods involve forming a plasma of all precursors within the processing region and depositing a boron-and-nitrogen material on a substrate located within the chamber.

Career Highlights

Jeong Hwan Kim is currently employed at Applied Materials, Inc., where he continues to advance semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor processing techniques.

Collaborations

Some of his coworkers include Siyu Zhu and Chuanxi Yang, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Jeong Hwan Kim's contributions to semiconductor processing through his patent on boron nitride demonstrate his commitment to innovation in the field. His work continues to influence advancements in technology and semiconductor manufacturing.