This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2025-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
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1 out of 6,542 Years Active: 2025-2026
Title: Innovations by Jeong Ho Mun in Photoresist Composition
Introduction
Jeong Ho Mun is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of photoresist compositions, particularly in the context of integrated circuit device manufacturing. His innovative approach focuses on the development of a nonionic non-chemically amplified photoresist composition that includes a photosensitive polymer.
Latest Patent Applications
Jeong Ho Mun's notable patent application is titled "PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE." This application describes a photoresist composition that includes a photosensitive polymer with a first repeating unit featuring a polarity inversion group and a second repeating unit containing a sensitizing group. The method outlined in the application involves forming a photoresist film on a feature layer, exposing a specific area to generate secondary electrons, and subsequently changing the polarity of the first repeating unit. This innovative process allows for the creation of a photoresist pattern that is essential for processing the feature layer.
Conclusion
Jeong Ho Mun's work in photoresist compositions represents a significant advancement in the manufacturing of integrated circuit devices. His innovative methods and compositions have the potential to enhance the efficiency and effectiveness of semiconductor fabrication processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile