Bad Berka, Germany

Jens Ungelenk

This inventor holds 1 USPTO granted patent. Top assignee: X-Fab Semiconductor Foundries Ag. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jens Ungelenk. Retrieved from https://idiyas.com/inventor/jens-ungelenk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2014

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jens Ungelenk: Innovator in Semiconductor Technology

Introduction

Jens Ungelenk is a notable inventor based in Bad Berka, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the alignment of electronic structures.

Latest Patents

Jens Ungelenk holds a patent for a method titled "Orientation of an electronic CMOS structure with respect to a buried structure in the case of a bonded and thinned-back stack of semiconductor wafers." This innovative method involves forming alignment marks during the fabrication of buried structures on semiconductor wafers. The alignment marks are strategically placed on the edge of the wafer to facilitate accurate alignment during the bonding process. The method ensures that after thinning the cover wafer, the alignment marks are visible, allowing for precise alignment of masks used in the fabrication of electronic structures.

Career Highlights

Jens Ungelenk is associated with X-FAB Semiconductor Foundries AG, where he applies his expertise in semiconductor technology. His work focuses on enhancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Jens collaborates with Holger Klingner, contributing to advancements in semiconductor technologies.

Conclusion

Jens Ungelenk's innovative work in semiconductor technology exemplifies the importance of precision in electronic structure fabrication. His contributions continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…