Hégenheim, France

Jens-Peter Biethan

This inventor holds 1 USPTO granted patent. Top assignee: Bühler Alzenau Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jens-Peter Biethan. Retrieved from https://idiyas.com/inventor/jens-peter-biethan-bnfhqwgi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jens-Peter Biethan and His Patent for a Tubular Sputter Cathode.

Introduction

Jens-Peter Biethan is an inventor associated with Hégenheim, France, and Bühler Alzenau GmbH. His patent work includes an invention designed to improve coating uniformity in magnetron sputtering systems.

Latest Patents

Biethan is associated with 1 patent, titled “Tubular Sputter Cathode.” The patent describes a magnetron sputtering system with a substrate, a rotatable tubular cathode, a mask, and at least one magnet supported inside the cathode. A controller adjusts the tilt of the magnet, the cathode, or both relative to the substrate to tune coating uniformity.

Career Highlights

The patent reflects Biethan’s work on sputtering equipment and the control of coating processes. His listed company affiliation is Bühler Alzenau GmbH.

Collaborations

Biethan’s named coworkers include Martin Stapp and Harro Hagedorn.

Conclusion

Jens-Peter Biethan’s patent addresses a practical challenge in magnetron sputtering by using adjustable component tilt to help achieve more uniform coatings.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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