This inventor holds 1 USPTO granted patent. Top assignee: Bühler Alzenau Gmbh. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jens-Peter Biethan and His Patent for a Tubular Sputter Cathode.
Introduction
Jens-Peter Biethan is an inventor associated with Hégenheim, France, and Bühler Alzenau GmbH. His patent work includes an invention designed to improve coating uniformity in magnetron sputtering systems.
Latest Patents
Biethan is associated with 1 patent, titled “Tubular Sputter Cathode.” The patent describes a magnetron sputtering system with a substrate, a rotatable tubular cathode, a mask, and at least one magnet supported inside the cathode. A controller adjusts the tilt of the magnet, the cathode, or both relative to the substrate to tune coating uniformity.
Career Highlights
The patent reflects Biethan’s work on sputtering equipment and the control of coating processes. His listed company affiliation is Bühler Alzenau GmbH.
Collaborations
Biethan’s named coworkers include Martin Stapp and Harro Hagedorn.
Conclusion
Jens-Peter Biethan’s patent addresses a practical challenge in magnetron sputtering by using adjustable component tilt to help achieve more uniform coatings.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile