The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Apr. 27, 2023
Applicant:
Bühler Alzenau Gmbh, Alzenau, DE;
Inventors:
Assignee:
Bühler Alzenau GmbH, Alzenau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/04 (2006.01); C23C 14/35 (2006.01); C23C 14/54 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3407 (2013.01); C23C 14/042 (2013.01); C23C 14/35 (2013.01); C23C 14/547 (2013.01); H01J 37/3405 (2013.01); H01J 37/3455 (2013.01);
Abstract
A magnetron sputtering system including a substrate to be coated and a magnetron sputtering device including at least one rotatable tubular cathode, a mask positioned between the cathode and the substrate and at least one magnet. The magnet is tiltably supported inside the tubular cathode. The system further includes a controller, wherein the controller is configured to control a tilt of the at least one magnet and/or a tilt of the at least one rotatable tubular cathode with respect to the substrate to be coated for tuning coating uniformity on the substrate.