Dachau, Germany

Jens Eckstein

This inventor holds 1 USPTO granted patent and 2 published patent applications and 3 EPO patents. Top assignee: Singulus Technologies Ag. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jens Eckstein. Retrieved from https://idiyas.com/inventor/jens-eckstein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Jens Eckstein: Innovator in Substrate Treatment Technology

Introduction

Jens Eckstein is a notable inventor based in Dachau, Germany. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique device that enhances the efficiency of treating substrates.

Latest Patents

Eckstein holds a patent for a device and method for treating substrates using a support roller made of porous material. This device features at least one rotatably supported support roller on which the substrate rests during operation. The support roller consists of a hollow cylinder made from a porous rigid material. The design allows for the delivery of treating liquid through the interior of the hollow cylinder, enabling effective treatment of the substrate's surface. The device is capable of treating multiple plate-shaped substrates arranged in a transport plane, showcasing its versatility and efficiency.

Career Highlights

Throughout his career, Jens Eckstein has worked with prominent companies in the semiconductor equipment industry. Notable among these are Singulus Technologies AG and Stangl Semiconductor Equipment AG. His experience in these organizations has contributed to his expertise in substrate treatment technologies.

Collaborations

Eckstein has collaborated with several professionals in his field, including Peter Reustle and Mathias Hohlmayer. These collaborations have likely enriched his work and contributed to the advancements in substrate treatment technology.

Conclusion

Jens Eckstein's innovative contributions to substrate treatment technology highlight his role as a significant inventor in the industry. His patented device demonstrates a practical application of his expertise, paving the way for advancements in substrate processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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