Company Filing History:
Years Active: 2007
Title: Jennifer M. Shepler: Innovator in Photomask Technology
Introduction
Jennifer M. Shepler is a notable inventor based in Newark, Delaware. She has made significant contributions to the field of photomask technology, particularly through her innovative patent that enhances the efficiency of photomask assembly.
Latest Patents
Jennifer holds a patent for a "System and method for automatically mounting a pellicle assembly on a photomask." This invention involves a method that includes loading a photomask into a mounting apparatus and subsequently loading a pellicle assembly into a back plate of the apparatus. The back plate is equipped with at least one load cell that measures the force applied by the mounting apparatus to both the photomask and the pellicle assembly. The measured force is then used to determine if the pellicle assembly can be successfully mounted on the photomask, creating a photomask assembly.
Career Highlights
Jennifer is currently employed at Toppan Photomasks, Inc., where she continues to develop innovative solutions in photomask technology. Her work has been instrumental in advancing the efficiency and effectiveness of photomask assembly processes.
Collaborations
Jennifer has collaborated with notable colleagues, including Ethan M. Frye and Kevin L. Griffin. These partnerships have contributed to her success and the advancement of technology in her field.
Conclusion
Jennifer M. Shepler is a pioneering inventor whose work in photomask technology has made a significant impact. Her innovative patent demonstrates her commitment to enhancing manufacturing processes in the semiconductor industry.