This inventor holds 1 USPTO granted patent. Top assignees: Amd Inc., Motorola Corporation. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 10 
1 out of 20,290 
Years Active: 2008
Title: Innovations of Jennifer Lynn Cooper in CMP Metal Polishing
Introduction
Jennifer Lynn Cooper is an accomplished inventor based in La Terrasse, France. She has made significant contributions to the field of semiconductor manufacturing, particularly in the area of chemical mechanical polishing (CMP). Her innovative approach has led to the development of a unique slurry formulation that enhances the efficiency and effectiveness of the polishing process.
Latest Patents
Jennifer Lynn Cooper holds a patent for a CMP metal polishing slurry and process with reduced solids concentration. This patent describes a low particle concentration formulation for slurry that is particularly useful in continuous CMP polishing of copper layers during semiconductor wafer manufacture. The slurry is characterized by particle concentrations generally less than 2 wt %, and advantageously less than 1 wt %. In particular embodiments, where the particle concentration is in a range of 50 to 450 PPM, an 8-fold increase in polishing rate over reactive liquid slurries has been realized. Slurries thus formulated also achieve a reduction in defectivity and in the variations in planarity from wafer to wafer during manufacture, by improving the stability of polishing quality. The slurry formulations permit substantial cost savings over traditional 2-component, reactive liquid and fixed/bonded abrasive slurries. In addition, the formulations provide an advantageous way during CMP to easily change the selectivity or rate of removal of one film material versus another.
Career Highlights
Throughout her career, Jennifer has worked with notable companies such as AMD Inc. and Motorola Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in semiconductor technology.
Collaborations
Jennifer has collaborated with talented individuals in her field, including Kevin Cooper and Yuri Solomentsev. These partnerships have fostered innovation and have been instrumental in her research and development efforts.
Conclusion
Jennifer Lynn Cooper's contributions to CMP technology through her innovative slurry formulation have significantly impacted the semiconductor manufacturing industry. Her work exemplifies the importance of innovation in enhancing manufacturing processes and achieving cost efficiencies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile