Jeng-Yang Pan

Title: Jeng-Yang Pan: Innovator in Semiconductor Technology

Introduction

Jeng-Yang Pan is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving semiconductor devices and processes, showcasing his expertise and innovative spirit.

Latest Patents

One of Jeng-Yang Pan's latest patents is titled "Surface passivation for germanium-based semiconductor structure." This patent describes a method for forming a semiconductor device that includes a substrate with a fin made of a first semiconductor material. The method involves exposing the substrate to an environment with hydrogen radicals to passivate the fin and epitaxially grow a cap layer of a second semiconductor material. Another notable patent is "Method and system for reducing wafer edge tungsten residue utilizing a spin etch." This invention outlines a method for reducing wafer edge residue after a chemical mechanical polishing operation, utilizing a spin etch operation to remove tungsten residue from the edges of the semiconductor wafer.

Career Highlights

Jeng-Yang Pan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to further develop his innovative ideas and contribute to advancements in semiconductor technology.

Collaborations

Throughout his career, Jeng-Yang Pan has collaborated with talented individuals such as Chin-Te Huang and Chen-Yi Huang. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the semiconductor field.

Conclusion

Jeng-Yang Pan's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods and systems continue to shape the future of semiconductor devices.