Company Filing History:
Years Active: 2016-2017
Title: The Innovative Contributions of Jen-Kan Yu
Introduction
Jen-Kan Yu is a notable inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that showcase his innovative approaches. His work primarily focuses on improving methods and apparatus for etching semiconductor substrates.
Latest Patents
Jen-Kan Yu's latest patents include advancements in internal plasma grid applications for semiconductor fabrication. These embodiments pertain to improved methods and apparatus for etching a semiconductor substrate. A plasma grid assembly is positioned in a reaction chamber to divide the chamber into upper and lower sub-chambers. The plasma grid assembly may include one or more plasma grids having slots of a particular aspect ratio, which allow certain species to pass through from the upper sub-chamber to the lower sub-chamber. In some cases, an electron-ion plasma is generated in the upper sub-chamber. Electrons that make it through the grid to the lower sub-chamber are cooled as they pass through. This process can result in an ion-ion plasma in the lower sub-chamber, which may be used to advantage in a variety of etching processes.
Career Highlights
Jen-Kan Yu is currently employed at Lam Research Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor fabrication processes.
Collaborations
Throughout his career, Jen-Kan Yu has collaborated with talented individuals such as Alex Paterson and Do Young Kim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Jen-Kan Yu's contributions to semiconductor fabrication through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to shape the future of technology in this critical industry.