Company Filing History:
Years Active: 2025
Title: Innovations of Jen-Hao Chien in Physical Vapor Deposition
Introduction
Jen-Hao Chien is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of physical vapor deposition (PVD) technology. His innovative methods have the potential to enhance the efficiency and quality of film deposition processes.
Latest Patents
Jen-Hao Chien holds a patent for a method titled "In situ and tunable deposition of a film." This method involves introducing a first physical vapor deposition (PVD) target and a second PVD target within a PVD system. The first target contains a boron-containing cobalt iron alloy (FeCoB) with an initial boron concentration, while the second target contains boron. The method includes determining parameters of the PVD system based on a target boron concentration that exceeds the initial boron concentration. Finally, a FeCoB film is deposited on a substrate according to the parameters of the PVD system. He has 1 patent to his name.
Career Highlights
Jen-Hao Chien is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in PVD technology. His work contributes to advancements in semiconductor manufacturing processes.
Collaborations
Some of his notable coworkers include Chia-Hsi Wang and Yen-Yu Chen, who collaborate with him on various projects within the company.
Conclusion
Jen-Hao Chien's innovative work in physical vapor deposition showcases his commitment to advancing technology in the semiconductor industry. His contributions are paving the way for improved manufacturing processes and materials.