Hsinchu, Taiwan

Jen Chieh Yu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jen Chieh Yu. Retrieved from https://idiyas.com/inventor/jen-chieh-yu-8txtiugx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jen Chieh Yu: Semiconductor Lithography Inventor.

Introduction

Jen Chieh Yu is an inventor associated with Hsinchu, Taiwan, and Taiwan Semiconductor Manufacturing Co., Ltd. His patent work concerns semiconductor lithography and the monitoring of tin used to generate light for patterning.

Latest Patents

Yu is associated with 1 patent: “Lithography System with Non-Invasive Monitoring and Methods.” The disclosed method forms a mask layer on a semiconductor wafer and supplies tin from a low-pressure reservoir to a high-pressure reservoir. At least two electrodes monitor the tin level in the high-pressure reservoir. When the level exceeds a threshold, tin is supplied to a droplet generator, which forms a tin droplet. The droplet generates light that patterns the mask layer.

Career Highlights

Yu’s listed patent connects reservoir-level monitoring and tin-droplet generation with light-based semiconductor patterning. He is associated with Taiwan Semiconductor Manufacturing Co., Ltd., a company based in Taiwan.

Collaborations

Chi Yang and Po-Yuan Yeh are identified as Yu’s coworkers.

Conclusion

Jen Chieh Yu’s patent describes a monitored tin-delivery process for generating light used to pattern semiconductor wafers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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