This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2020-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020-2025
Title: Innovations by Inventor Jen Chieh Lai
Introduction
Jen Chieh Lai is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, with a focus on enhancing the efficiency of polishing processes. His innovative approaches have led to the development of two patents that showcase his expertise and creativity.
Latest Patents
One of Jen Chieh Lai's latest patents is a vacuum assembly for chemical mechanical polishing. This method involves depositing a slurry onto a polishing pad at a chemical mechanical polishing (CMP) station. During the process, a workpiece is polished, and the polishing by-products, along with the slurry, are effectively removed from the polishing pad by a vacuum head. The CMP apparatus is designed with a polishing pad that rotates during the CMP process. It also includes a slurry dispenser that deposits the slurry onto the polishing surface of the pad. A key feature of this apparatus is the momentum vacuum assembly, which has a slotted opening facing the polishing surface. This assembly is connected to a first suction line that leads to a vacuum source, allowing for the efficient transport of polishing products removed from the pad.
Career Highlights
Jen Chieh Lai is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and contribute to advancements in semiconductor manufacturing processes. His work is instrumental in improving the quality and efficiency of semiconductor devices.
Collaborations
Throughout his career, Jen has collaborated with talented individuals such as Yu-Chen Wei and Chih-Yuan Yang. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Jen Chieh Lai's contributions to the field of chemical mechanical polishing exemplify his dedication to innovation and excellence. His patents reflect a commitment to improving manufacturing processes, making him a valuable asset in the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile