Jeffrey X Tran

Title: Innovations of Jeffrey X Tran in Plasma Etching Technology

Introduction

Jeffrey X Tran is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of plasma etching technology, particularly in the fabrication of photomasks. His innovative methods have paved the way for advancements in semiconductor manufacturing.

Latest Patents

Tran holds a patent for a method titled "Method for plasma etching a chromium layer suitable for photomask fabrication." This patent describes a process that involves providing a filmstack in an etching chamber, where a chromium layer is partially exposed through a patterned layer. The method includes the use of halogen-containing process gases and the application of power pulses to etch the chromium layer through a patterned mask. This technique is particularly beneficial for the fabrication of photomasks, which are essential in the semiconductor industry.

Career Highlights

Jeffrey X Tran is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on developing innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes. With a patent portfolio that includes 1 patent, Tran has established himself as a key player in his field.

Collaborations

Tran has collaborated with notable colleagues, including Xiaoyi Chen and Michael N Grimbergen. These partnerships have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Jeffrey X Tran's contributions to plasma etching technology demonstrate his commitment to innovation in the semiconductor field. His patented methods are vital for the ongoing development of photomask fabrication techniques.