Applied Materials, Inc.

Jeffrey X Tran

Ajay Kumar

Michael N Grimbergen

Madhavi R Chandrachood

Xiaoyi Chen

Simon W Tam

Ramesh Krishnamurthy

A method for etching a chromium layer is provided herein. In one embodiment, a method for etching a chromium layer includes providing a filmstack in an etching chamber, the filmstack having a chromium layer partially exposed through a patterned layer, providing at least one halogen containing process gas to a processing chamber, biasing the layer disposed on a substrate support in the processing chamber with a plurality of power pulses less than 600 Watts, and etching the chromium layer through a patterned mask. The method for plasma etching a chromium layer described herein is particularly suitable for fabricating photomasks.

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Fremont, CA, United States of America

Jeffrey X Tran